Browsing Faculty and Staff Scholarship by Discipline "Electronics Engineering"

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  • Serry, Mohamed; Rubin, Andrew; Mohamed, Abdo; Sedky, Sherif (USPTO, 2019-02-20)
    Polycrystalline silicon germanium (SiGe) can offer excellent etch selectivity to silicon during cryogenic deep reactive ion etching in an SF6/O2 plasma. Etch selectivity of over 800:1 (Si:SiGe) may be achieved at etch ...